P00100 - SEMI P1 - Specification for Hard Surface Photomask Substrates Revision:SEMI P1-0708E - Inactive These mounting requirements may be

These mounting requirements may be used in other tools used to fabricate or measure EUV masks

SEMI F41 — Guide for Qualification of a Bulk Chemical Distribution System Used in Semiconductor Processing

前方の支持機構（フロントリテイニングフィーチャ）

This Document also provides a guide for a grade of hexamethyldisilazane for which a need has been identified

The purpose of this Document is to provide a permanent withdrawal notice for SEMI F15 indicating that the technical content has been superseded by Appendix 2

P00100 - SEMI P1 - Specification for Hard Surface Photomask Substrates Revision:SEMI P1-0708E - Inactive These mounting requirements may beNOTICE: This Standard or Safety Guideline has an Inactive Status because the conditions to maintain Current Status have not been met. Inactive Standards or Safety Guidelines are available from SEMI and continue to be valid for use. NOTICE: This Document was completely rewritten in 2008. This Specification covers the general requirements of the glass substrate for hard surface photomasks. This Document covers square photomasks up to 7 inches in length.