G06200 - SEMI G62 - 銀めっきの試験方法 StdTpc-Equipment - Facilities Interface Floating Zone (FZ) method for

Floating Zone (FZ) method for single crystal silicon wafers

This Standard was technically approved by the Flat Panel Display – Color Global Technical Committee

This Test Method covers the measurement of generation lifetime and generation velocity of silicon wafers

The scope of this Document lists the proposed impurity limits of 25% tetramethylammonium hydroxide used in the semiconductor industry

Refer to SEMI C90 for additional requirements for the use of polymers in LCDS

G06200 - SEMI G62 - 銀めっきの試験方法 StdTpc-Equipment - Facilities Interface Floating Zone (FZ) method forglobal Assembly & Packaging Technical Committee201171global Audits and Reviews Subcommittee20118www. semiviews. org www. semi. org199520023 : Referenced SEMI Standards SEMI G55 Test Method for Measurement of Silver Plating Brightness SEMI G56 Test Method for Measurement of Silver Plating Thickness